<?xml version="1.0"?>
<Articles JournalTitle="Frontiers in Dentistry">
  <Article>
    <Journal>
      <PublisherName>Tehran University of Medical Sciences</PublisherName>
      <JournalTitle>Frontiers in Dentistry</JournalTitle>
      <Issn>2676-296X</Issn>
      <Volume>12</Volume>
      <Issue>12</Issue>
      <PubDate PubStatus="epublish">
        <Year>2016</Year>
        <Month>08</Month>
        <Day>15</Day>
      </PubDate>
    </Journal>
    <title locale="en_US">Temperature Rise Induced by Light Curing Unit Can Shorten Enamel Acid-Etching Time</title>
    <FirstPage>921</FirstPage>
    <LastPage>925</LastPage>
    <Language>EN</Language>
    <AuthorList>
      <Author>
        <FirstName>Ahmad</FirstName>
        <LastName>Najafi Abrandabadi</LastName>
      </Author>
      <Author>
        <FirstName>Seyedeh Mahsa</FirstName>
        <LastName>Sheikh-Al-Eslamian</LastName>
      </Author>
      <Author>
        <FirstName>Narges</FirstName>
        <LastName>Panahandeh</LastName>
        <affiliation locale="en_US">Assistant Professor, Dental Research Center, Dental School, Shahid Beheshti University of Medical Sciences, Tehran, Iran</affiliation>
      </Author>
    </AuthorList>
    <History>
      <PubDate PubStatus="received">
        <Year>2015</Year>
        <Month>11</Month>
        <Day>16</Day>
      </PubDate>
      <PubDate PubStatus="accepted">
        <Year>2016</Year>
        <Month>02</Month>
        <Day>15</Day>
      </PubDate>
    </History>
    <abstract locale="en_US">Objectives: The aim of this in-vitro study was to assess the thermal effect of light emitting diode (LED) light curing unit on the enamel etching time.

Materials and Methods: Three treatment groups with 15 enamel specimens each were used in this study: G1: Fifteen seconds of etching, G2: Five seconds of etching, G3: Five seconds of etching plus LED light irradiation (simultaneously). The micro shear bond strength (&#xB5;SBS) of composite resin to enamel was measured.

Results: The mean &#xB5;SBS values &#xB1; standard deviation were 51.28&#xB1;2.35, 40.47&#xB1;2.75 and 50.00&#xB1;2.59 MPa in groups 1, 2 and 3, respectively. There was a significant difference between groups 1 and 2 (P=0.013) and between groups 2 and 3 (P=0.032) in this respect, while there was no difference between groups 1 and 3 (P=0.932).

Conclusion: Simultaneous application of phosphoric acid gel over enamel surface and light irradiation using a LED light curing unit decreased enamel etching time to five seconds without compromising the &#xB5;SBS.</abstract>
    <web_url>https://fid.tums.ac.ir/index.php/fid/article/view/863</web_url>
    <pdf_url>https://fid.tums.ac.ir/index.php/fid/article/download/863/855</pdf_url>
  </Article>
</Articles>
